第三屆微電子學(xué)與等離子體技術(shù)國(guó)際會(huì)議(ICMAP-2011)
第三屆微電子學(xué)與等離子體技術(shù)國(guó)際會(huì)議(ICMAP-2011)
英文名稱:The3rdInternationalConferenceonMicroelectronicsandPlasmaTechnology(ICMAP-2011)
會(huì)議時(shí)間:2011/7/4~2011/7/7
會(huì)議行業(yè):電子電力
第三屆微電子學(xué)與等離子體技術(shù)國(guó)際會(huì)議(ICMAP-2011)會(huì)議背景:
The3rdInternationalConferenceonMicroelectronicsandPlasmaTechnology(ICMAP-2011)willbeheldduringtheperiodofJuly4-7,2011inDalian,China.Theconferenceisintendedtoprovideanopenforumtoreportonrecenttechnicaladvancesofplasma-relateddisciplineswithstrongindustrialapplicationbackground,discusskeyissuesandidentifyfuturedevelopment.Theconferencescopewillincludeavarietyofprocessingtechnologiesrelatedtosemiconductor,display,andenergyconversiondevices,newlydevelopedmaterials,bio-medicalapplications,andplasmageneration,plasmadiagnosticsandsimulation,etc.
第三屆微電子學(xué)與等離子體技術(shù)國(guó)際會(huì)議(ICMAP-2011)征文要求:
Theconferenceincludesinvitedandcontributedpapersonsomeorallofthefollowingtopics.
Materialsandprocessesforsemiconductordevices
Plasmatechnologyfornano-scaleSidevices
Thinfilmspreparedbyplasmatechnology
Plasmaetchingtechnology
Nano-materialsandnano-scaledevices
New-conceptmaterials,processes,anddevices
Materialsandprocessesfordisplaydevices
Processingforflatpaneldisplaydevices
Novelthinfilmtransistorsfordisplaybackplanes
Advancedflexibledisplaytechnology
Nextgenerationdisplaydevices
Materialsandprocessesforenergyconversiondevices
High-efficiencysolarcells
ThinfilmsolarcellswithPECVDtechnology
Newmaterialsandprocessingtechnologiesforsolarcells
Newmaterialsforenergyconversionandstorage
Plasmaforbio-medicalapplications
Bio-plasmassources
Plasma-Biomaterialsinteraction
Plasmamedicine
Plasmagenerationsandsimulations
Novelplasmasources
Plasmasimulations
Plasmadiagnostics
第三屆微電子學(xué)與等離子體技術(shù)國(guó)際會(huì)議(ICMAP-2011)聯(lián)系方式:
郵編:116024
地址:SchoolofPhysics&OptoelectronicEngineeringDalianUniversityofTechnology(DLUT),Dalian,Liaoning,116024,China
Email:ICMAP2011@dlut.edu.cn
原文地址:
http://fsxymc.com.cn/meeting/242.html
會(huì)議時(shí)間:2011/7/4~2011/7/7
會(huì)議行業(yè):電子電力
第三屆微電子學(xué)與等離子體技術(shù)國(guó)際會(huì)議(ICMAP-2011)會(huì)議背景:
The3rdInternationalConferenceonMicroelectronicsandPlasmaTechnology(ICMAP-2011)willbeheldduringtheperiodofJuly4-7,2011inDalian,China.Theconferenceisintendedtoprovideanopenforumtoreportonrecenttechnicaladvancesofplasma-relateddisciplineswithstrongindustrialapplicationbackground,discusskeyissuesandidentifyfuturedevelopment.Theconferencescopewillincludeavarietyofprocessingtechnologiesrelatedtosemiconductor,display,andenergyconversiondevices,newlydevelopedmaterials,bio-medicalapplications,andplasmageneration,plasmadiagnosticsandsimulation,etc.
第三屆微電子學(xué)與等離子體技術(shù)國(guó)際會(huì)議(ICMAP-2011)征文要求:
Theconferenceincludesinvitedandcontributedpapersonsomeorallofthefollowingtopics.
Materialsandprocessesforsemiconductordevices
Plasmatechnologyfornano-scaleSidevices
Thinfilmspreparedbyplasmatechnology
Plasmaetchingtechnology
Nano-materialsandnano-scaledevices
New-conceptmaterials,processes,anddevices
Materialsandprocessesfordisplaydevices
Processingforflatpaneldisplaydevices
Novelthinfilmtransistorsfordisplaybackplanes
Advancedflexibledisplaytechnology
Nextgenerationdisplaydevices
Materialsandprocessesforenergyconversiondevices
High-efficiencysolarcells
ThinfilmsolarcellswithPECVDtechnology
Newmaterialsandprocessingtechnologiesforsolarcells
Newmaterialsforenergyconversionandstorage
Plasmaforbio-medicalapplications
Bio-plasmassources
Plasma-Biomaterialsinteraction
Plasmamedicine
Plasmagenerationsandsimulations
Novelplasmasources
Plasmasimulations
Plasmadiagnostics
第三屆微電子學(xué)與等離子體技術(shù)國(guó)際會(huì)議(ICMAP-2011)聯(lián)系方式:
郵編:116024
地址:SchoolofPhysics&OptoelectronicEngineeringDalianUniversityofTechnology(DLUT),Dalian,Liaoning,116024,China
Email:ICMAP2011@dlut.edu.cn
原文地址:
http://fsxymc.com.cn/meeting/242.html
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